Silicon film formation by chemical transport in atmospheric-pressure pure hydrogen plasma

Journal of Applied Physics

Volumn 102, Issue 2, 2007, Pages

  Ohmi, Hiromasa ^a   Kakiuchi, Hiroaki ^a   Hamaoka, Yoshinori ^a   Yasutake, Kiyoshi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ATMOSPHERIC PRESSURE; ELECTRODES; FILMS; HYDROGEN; PLASMAS;

CHEMICAL TRANSPORT; HYDROGEN ETCHING RATE; HYDROGEN PLASMA;

POLYSILICON;

EID: 34547606786     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2753675     Document Type: Article

References (26)

1. N. Kosku and S. Miyazaki, Thin Solid Films 511-512, 265 (2006).
2. J.-D. Gu and P.-L. Chen, Thin Solid Films 498, 2 (2006).
3. N. Fujiki, Y. Nakatani, K. Inoue, M. Okuyama, and Y. Hamakawa, Jpn. J. Appl. Phys., Part 1 28, 829 (1989).
4. H. Sunayama, K. Yamada, M. Karasawa, and K. Ishibashi, Thin Solid Films 430, 226 (2003).
5. A. Focsa, A. Slaoui, E. Pihan, F. Snijkers, P. Leempoel, G. Beaucarne, and J. Poortmans, Thin Solid Films 511-512, 404 (2006).
6. Y. Fujioka, Sol. Energy Mater. Sol. Cells 90, 3416 (2006).
7. Y. Mori, K. Yoshii, K. Yasutake, H. Kakiuchi, H. Ohmi, and K. Wada, Thin Solid Films 444, 138 (2003).
8. S. Veprek and V. Marecek, Solid-State Electron. 11, 683 (1968).
9. H. Matsumura, K. Kamesaki, A. Masuda, and A. Izumi, Jpn. J. Appl. Phys., Part 2 40, L289 (2001).
10. A. P. Webb and S. Veprek, Chem. Phys. Lett. 62, 173 (1979).
11. H. Ohmi, H. Kakiuchi, K. Nishijima, H. Watanabe, and K. Yasutake, Jpn. J. Appl. Phys., Part 1 45, 8488 (2006).
12. P. Gupta, V. L. Colvin, and S. M. George, Phys. Rev. B 37, 8234 (1988).
13. T. Ohmi, J. Electrochem. Soc. 143, 2957 (1996).
14. H. Ohmi, H. Kakiuchi, K. Yasutake, Y. Nakahama, Y. Ebata, K. Yoshii, and Y. Mori, Jpn. J. Appl. Phys., Part 1 45, 3581 (2006).
15. M. Takai, T. Nishimoto, M. Kondo, and A. Matsuda, Appl. Phys. Lett. 77, 2828 (2000).
16. S. Takashima, M. Hori, T. Goto, A. Kono, and K. Yoneda, J. Appl. Phys. 90, 5497 (2001).
17. M. Mozeti, A. Vesel, V. Monna, and A. Ricard, Vacuum 71, 201 (2003).
18. H. Kakinuma, M. Mohri, M. Sakamoto, and T. Tsuruoka, J. Appl. Phys. 70, 7374 (1991).
19. G. Lucovsky, R. J. Nemanich, and J. C. Knights, Phys. Rev. B 19, 2064 (1979).
20. M. Niwano, J. Kageyama, K. Kurita, K. Kinashi, I. Takahashi, and N. Miyamoto, J. Appl. Phys. 76, 2157 (1994).
21. S. M. Gates, R. R. Kunz, and C. M. Greenlief, Surf. Sci. 207, 364 (1989).
22. G. A. Hebner, E. V. Barrat, P. A. Miller, A. M. Paterson, and J. P. Holland, Plasma Sources Sci. Technol. 15, 879 (2006).
23. P. A. Miller, G. A. Hebner, K. E. Greenberg, and P. D. Pochan, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995).
24. T. Novikova, B. Kalache, P. Bulkin, K. Hassouni, W. Morscheidt, and P. Roca i Cabarrocas, J. Appl. Phys. 93, 3198 (2003).
25. A. Matsuda, M. Takai, T. Nishimoto, and M. Kondo, Sol. Energy Mater. Sol. Cells 78, 3 (2003).
26. U. Frantz, Contrib. Plasma Phys. 42, 675 (2002).