Catalytic chemical sputtering: A novel method for obtaining large-grain polycrystalline silicon

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 3 B, 2001, Pages

  Matsumura, H ^a   Kamesaki, K ^a   Masuda, A ^a   Izumi, A ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Catalytic chemical sputtering; Catalyzer; Chemical transport; Grain size; Hydrogen atoms; Polycrystalline silicon

Indexed keywords

CATALYTIC CRACKING; FILM PREPARATION; GRAIN SIZE AND SHAPE; HYDROGEN; LOW TEMPERATURE OPERATIONS; POLYCRYSTALLINE MATERIALS; SILANES; SPUTTER DEPOSITION; SUBSTRATES; THERMAL EFFECTS; TUNGSTEN;

CATALYTIC CHEMICAL SPUTTERING;

POLYSILICON;

EID: 0035867366     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l289     Document Type: Article

References (7)