Preparation of poly-Si films by Cat-CVD for thin film transistor

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 226-229

  Sunayama, Hideki ^a   Yamada, Kazutaka ^a   Karasawa, Minoru ^a   Ishibashi, Keiji ^a  

^a Canon ANELVA Technix Corporation   (Japan)

Author keywords

Attenuated total reflection Fourier transform infrared; Cat CVD apparatus; Hot wall; Poly Si film

Indexed keywords

ATTENUATION; CATALYSIS; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN SIZE AND SHAPE; POLYSILICON; RAMAN SPECTROSCOPY; THIN FILM TRANSISTORS;

CRYSTALLINE FRACTIONS;

AMORPHOUS FILMS;

EID: 0038485853     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00120-2     Document Type: Conference Paper

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