Graphene-silica composite thin films as transparent conductors

Nano Letters

Volumn 7, Issue 7, 2007, Pages 1888-1892

  Watcharotone, Supinda ^a   Diking Sasha Stankovich, Dmitriy A ^a   Pinery, Richard ^a   Jung, Inhwa ^a   Dommett, Geoffrey H B ^a   Evmenenko, Guennadi ^b   Wu, Shang En ^c   Chen, Shu Fang ^c   Liu, Chuan Pu ^c   Nguyen, Sonbinh T ^b   Ruoff, Rodney S ^a  

^a Northwestern University   (United States)

^b NORTHWESTERN UNIVERSITY   (United States)

^c NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

GRAPHENE OXIDE; TRANSPARENT CONDUCTORS; X-RAY REFLECTIVITY;

CARBON NANOTUBES; ELECTRIC CONDUCTIVITY; GLASS; SCANNING ELECTRON MICROSCOPY; SILICA; SOLS; TRANSMISSION ELECTRON MICROSCOPY;

COMPOSITE FILMS;

CARBON NANOTUBE; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; COMPARATIVE STUDY; ELECTRIC CONDUCTIVITY; NANOTECHNOLOGY;

ELECTRIC CONDUCTIVITY; NANOTECHNOLOGY; NANOTUBES, CARBON; SILICON DIOXIDE;

EID: 34547606541     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl070477+     Document Type: Article

References (51)

1. Finley, J. J. Thin Solid Films 1999, 351, 264-273.
2. Romeas, V.; Pichat, P.; Guillard, C.; Chopin, T.; Lehaut, C. Ind. Eng. Chem. Res. 1999, 38, 3878-3885.
3. Smith, J. G., Jr.; Delozier, D. M.; Connell, J. W.; Watson, K. A. Polymer 2004, 45, 6133-6142.
4. Watson, K. A.; Ghose, S.; Delozier, D. M.; Smith, J. G.; Connell, J. W. Polymer 2005, 46, 2076-2085.
5. Beneking, C.; Rech, B.; Wieder, S.; Kluth, O.; Wagner, H.; Frammelsberger, W.; Geyer, R.; Lechner, P.; Rubel, H.; Schade, H. Thin Solid Films 1999, 351, 241-246.
6. Rowell, M. W.; Topinka, M. A.; McGehee, M. D.; Prall, H. J.; Dennler, G.; Sariciftci, N. S.; Hu, L.; Gruner, G. Appl. Phys. Lett. 2006, 88, 233506-1-3.
7. Zhang, J.; Au, K. H.; Zhu, Z. Q.; O'Shea, S. Opt. Mater. 2004, 26, 47-55.
8. Parikh, K.; Cattanach, K.; Rao, R.; Suh, D. S.; Wu, A.; Manohar, S. K. Sens. Actuators, B 2006, 113, 55-63.
9. Gan, Y.; Liu, J. X.; Zeng, S. N. Surf. Coat. Technol. 2006, 201, 25-29.
10. Wei, Q.; Zheng, H. X.; Huang, Y. H. Sol. Energy Mater. Sol. Cells 2001, 68, 383-390.
11. Betz, U.; Olsson, M. K.; Marthy, J.; Escola, M. F.; Atamny, F. Surf. Coat. Technol. 2006, 200, 5751-5759.
12. Ow-Yang, C. W.; Spinner, D.; Shigesato, Y.; Paine, D. C. J. Appl. Phys. 1998, 83, 145-154.
13. Terzini, E.; Thilakan, P.; Minarini, C. Mater. Sci. Eng., B 2000, 77, 110-114.
14. Chang, J. F.; Wang, H. L.; Hon, M. H. J. Cryst. Growth 2000, 211, 93-97.
15. Camino, D.; Jones, A. H. S.; Mercs, D.; Teer, D. G. Vacuum 1999, 52, 125-131.
16. Konca, E.; Cheng, Y. T.; Weiner, A. M.; Dasch, J. M.; Alpas, A. T. Surf. Coat. Technol. 2005, 200, 1783-1791.
17. Konca, E.; Cheng, Y. T.; Weiner, A. M.; Dasch, J. M.; Alpas, A. T. Surf. Coat. Technol. 2006, 200, 3996-4005.
18. Charitidis, C.; Logothetidis, S. Thin Solid Films 2005, 482, 120-125.
19. Anders, S.; Callahan, D. L.; Pharr, G. M.; Tsui, T. Y.; Bhatiad, C. S. Surf. Coat. Technol. 1997, 94-95, 189-194.
20. Tong, H. H.; Monteiro, O. R.; Brown, I. G. Surf. Coat. Technol. 2001, 136, 211-216.
21. Maki, K.; Komiya, N.; Suzuki, A. Thin Solid Films 2003, 445, 224-228.
22. Maruyama, T.; Tabata, K. Jpn. J. Appl. Phys. 1990, 29, L355-L357.
23. Rozati, S. M.; Ganj, T. Renew. Energy 2004, 29, 1671-1676.
24. Malaczynski, G. W.; Elmoursi, A. A.; Leung, C. H.; Hamdi, A. H.; Campbell, A. B. J. Mater. Res. 2000, 15, 590-592.
25. Aziz, H.; Popovic, Z. D. Chem. Mater. 2004, 16, 4522-4532.
26. Kim, S. S.; Choi, S. Y.; Park, C. G.; Jin, H. W. Thin Solid Films 1999, 347, 155-160.
27. Ohyama, M.; Kozuka, H.; Yoko, T. J. Am. Ceram. Soc. 1998, 81, 1622-1632.
28. Tsuchiya, T.; Emoto, T.; Sei, T. J. Non-Cryst. Solids 1994, 178, 327-332.
29. Shimono, D.; Tanaka, S.; Torikai, T.; Watari, T.; Murano, M. J. Ceram. Proc. Res. 2001, 2, 184-188.
30. Gong, K. P.; Zhang, M. N.; Yan, Y. M.; Su, L.; Mao, L. Q.; Xiong, S. X.; Chen, Y. Anal. Chem. 2004, 76, 6500-6505.
31. Wei, Y.; Yeh, J. M.; Jin, D. L.; Jia, X. R.; Wang, J. G.; Jang, G. W.; Chen, C. C.; Gumbs, R. W. Chem. Mater. 1995, 7, 969-974.
32. Shimamura, A.; Hubert, Th.; Thust, H. Surf. Interface Anal 2004, 36, 1207-1209.
33. Gruner, G. J. Mater. Chem. 2006, 16, 3533-3539.
34. Viculis, L. M.; Mack, J. J.; Mayer, O. M.; Hahn, H. T.; Kaner, R. B. J. Mater. Chem. 2005, 15, 974-978.
35. Stankovich, S.; Piner, R. D.; Chen, X.; Wu, N.; Nguyen, S. T.; Ruoff, R. S. J. Mater. Chem. 2006, 16, 155-158.
36. Stankovich, S.; Piner, R. D.; Nguyen, S. T.; Ruoff, R. S. Carbon 2006, 44, 3342-3347.
37. Stankovich, S.; Dikin, D. A.; Dommett, G. H. B.; Kohlhaas, K. M.; Zimney, E. J.; Stach, E. A.; Piner, R. D.; Nguyen, S. T.; Ruoff, R. S. Nature 2006, 442, 282-286.
38. Liu, P.; Gong, K. Carbon 1999, 37, 706-707.
39. Bourlinos, A. B.; Gourais, D.; Petridis, D.; Szabo, T.; Szeri, A.; Dekany, I. Langmuir 2003, 19, 6050-6055.
40. Brinker, C. J.; Scherer, G. W. Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing; Academic Press: San Diego, CA, 1990; pp 108-216.
41. Hummers, W. S.; Offeman, R. E. J. Am. Chem. Soc. 1958, 80, 1339-1339.
42. 2) produced by the complete hydrolysis of the initial amount of TMOS. It is assumed that this mass ratio is not influenced by the spin-coating step.
43. Yu, S.; Wong, T. K. S.; Hu, X.; Goh, T. K. Thin Solid Films 2004, 462-463, 306-310.
44. Almeida, R. M. Int. J. Optoelectron. 1994, 9, 135-142.
45. Bornside, D. E.; Macosko, C. W.; Scriven, L. E. J. Imaging Sci. Technol. 1987, 13, 122-130.
46. Wen, X.; Garland, C. W.; Hwa, T.; Kardar, M.; Kokufuta, E.; Li, Y.; Orkisz, M.; Tanaka, T. Nature 1992, 355, 426-428.
47. Evmenenko, G.; van der Boom, M. E.; Kmetko, J.; Dugan, S. W.; Marks, T. J.; Dutta, P. J. Chem. Phys. 2001, 115, 6722-6727.
48. Xiang, C. S.; Pan, Y. B.; Liu, X. J.; Shi, X. M.; Sun, X. W.; Guo, J. K. J. Nanosci. Nanotechnol. 2006, 6, 3835-3841.
49. Xiang, C. S. 2007, private communication.
50. Xiang, C. S.; Shi, X. M.; Pan, Y. B.; Guo, J. K. Key Eng. Mater. 2005, 280-283, 123-126.
51. Granqvist, C. G.; Hultaker, A. Thin Solid Films 2002, 411, 1-5.