Transparent conductive indium tin oxide film fabricated by dip-coating technique from colloid precursor

Surface and Coatings Technology

Volumn 201, Issue 1-2, 2006, Pages 25-29

  Gan, Yong ^a   Liu, Jiaxiang ^a   Zeng, Shengnan ^a  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

Colloid; Dip coating; Indium tin oxide film; Microstructure

Indexed keywords

ATOMIC FORCE MICROSCOPY; COATING TECHNIQUES; COLLOIDS; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; INGOTS; MICROSTRUCTURE; MORPHOLOGY; OPTICAL PROPERTIES; SURFACE ROUGHNESS; TEMPERATURE; X RAY DIFFRACTION ANALYSIS;

COLLOID PRECURSOR; DIP-COATING; INDIUM TIN OXIDE FILM;

INDIUM ALLOYS;

ATOMIC FORCE MICROSCOPY; COATING TECHNIQUES; COLLOIDS; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; INDIUM ALLOYS; INGOTS; MICROSTRUCTURE; MORPHOLOGY; OPTICAL PROPERTIES; SURFACE ROUGHNESS; TEMPERATURE; X RAY DIFFRACTION ANALYSIS;

EID: 33746164334     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.10.027     Document Type: Article

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