Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography

Applied Optics

Volumn 46, Issue 18, 2007, Pages 3736-3746

  Soufli, Regina ^a   Hudyma, Russell M ^a,b   Spiller, Eberhard ^a   Gullikson, Eric M ^c   Schmidt, Mark A ^a   Robinson, Jeff C ^a   Baker, Sherry L ^a   Walton, Christopher C ^a   Taylor, John S ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b Hyperion Development LLC   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; FREQUENCY MODULATION; IMAGE ANALYSIS; LITHOGRAPHY;

EXTREME ULTRAVIOLET (EUV); LITHOGRAPHIC IMAGING SYSTEMS; VELOCITY MODULATION TECHNIQUE;

MULTILAYERS;

ALGORITHM; ARTICLE; EQUIPMENT DESIGN; MAGNETISM; OPTICS; RADIATION SCATTERING; STATISTICAL MODEL; SURFACE PROPERTY; THEORETICAL MODEL; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROPHOTOMETRY;

ALGORITHMS; EQUIPMENT DESIGN; MAGNETICS; MODELS, STATISTICAL; MODELS, THEORETICAL; OPTICS; SCATTERING, RADIATION; SPECTROPHOTOMETRY, ULTRAVIOLET; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

EID: 34447640370     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.46.003736     Document Type: Article

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