Fabrication and metrology of diffraction limited soft x-ray optics for the EUV microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5193, Issue , 2004, Pages 18-28

  Dinger, Udo ^a   Seitz, Günther ^a   Schulte, Stefan ^a   Eisert, Frank ^a   Münster, Christian ^a   Burkart, Stefan ^a   Stacklies, Siegfried ^a   Bustaus, Christian ^a   Höfer, Hubert ^a   Mayer, Maximilian ^a   Fellner, Bernhard ^a   Hocky, Oliver ^a   Rupp, Markus ^a   Riedelsheimer, Klaus ^a   Kürz, Peter ^a  

^a CARL ZEISS SMT AG   (Germany)

Author keywords

EUV. lithography; Mirrors; Roughness; X ray optics

Indexed keywords

ASPHERICITY; ON-AXIS MIRRORS;

ASPHERICS; DIFFRACTION; FUSED SILICA; GLASS CERAMICS; INTERFEROMETERS; MICROELECTRONICS; MICROPROCESSOR CHIPS; MIRRORS; SURFACE TOPOGRAPHY; X RAY OPTICS;

LITHOGRAPHY;

EID: 11144354521     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.511489     Document Type: Conference Paper

References (16)

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