Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system

Applied Optics

Volumn 41, Issue 16, 2002, Pages 3262-3269

  Montcalm, Claude ^a,b   Grabner, R Frederick ^a   Hudyma, Russell M ^a,c   Schmidt, Mark A ^a   Spiller, Eberhard ^a   Walton, Christopher C ^a   Wedowski, Marco ^a,d   Folta, James A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b VEECO INSTRUMENTS INC   (United States)

^c Paragon Optics Inc   (United States)

^d CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036603505     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.003262     Document Type: Article

References (18)

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