Secondary ion mass spectrometry backside analysis of barrier layers for copper diffusion

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 350-354

  Gu, C ^a   Pivovarov, A ^a   Garcia, R ^a   Stevie, F ^a   Griffis, D ^a   Moran, J ^b   Kulig, L ^b   Richards, J F ^b  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDPASS FILTERS; DIFFUSION; METALLIZING; NITROGEN; POLISHING; SECONDARY ION MASS SPECTROMETRY; SILICA; SURFACE PROPERTIES; TANTALUM; TANTALUM COMPOUNDS;

BARRIER LAYERS; BARRIER MATERIALS;

COPPER;

EID: 1642345135     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1617278     Document Type: Conference Paper

References (19)

1. Y. Lee, B. Suh, M. Kwon, and C. Park, J. Appl. Phys. 85, 1927 (1999).
2. Y. Kawashima, T. Ide, and K. Shimizu, J. Surf. Anal. 5, 116 (1999).
3. Z. X. Jiang, S. Chen, S. Backer, J. J. Lee, B. Taylor, and D. Sieloff, 15th Annual SIMS Workshop Proceedings, Clearwater, FL, May 2002, p. 47.
4. C. J. Palmstrom, S. A. Schwarz, E. D. Marshall, E. Yablonovitch, J. P. Harbison, C. L. Schwartz, L. Florez, T. J. Gmitter, L. C. Wang, and S. S. Lau, Mater. Res, Soc. Symp. Proc. 126, 283 (1988).
5. C. J. Palmstrom, S. A. Schwarz, E. D. Marshall, E. Yablonovitch, J. P. Harbison, C. L. Schwartz, L. Florez, T. J. Gmitter, L. C. Wang, and S. S. Lau, J. Appl. Phys. 67, 334 (1990).
6. R. T. Lareau, Secondary Ion Mass Spectrometry, SIMS VI, edited by A. Benninghoven, A. M. Huber, and H. W. Werner (Wiley, New York, 1988), p. 437.
7. I. Banerjee and D. Kuzminov, J. Vac. Sci. Technol. B 12, 205 (1994).
8. P. Ronsheim, D. Chidambarrao, B. Jagannathan, and D. Hunt, J. Vac. Sci. Technol. B 20, 448 (2002).
9. K. L. Yeo, A. T. S. Wee, R. Liu, C. M. Ng, and A. See, Surf. Interface Anal, 33, 373 (2002).
10. C. Hongo, M. Tomita, M. Takenaka, and A. Murakoshi, Appl. Surf. Sci. 203-204, 264 (2003).
11. J. Bennett and K-S. Lam, 15th Annual SIMS Workshop Proceedings, Clearwater, FL, May 2002, pp, 48-49.
12. Allied High Tech Products, Inc., 2376 East Pacifica Place, Rancho Dominguez, CA 90220 (http://www.alliedhightech.com).
13. South Bay Technologies, Inc., 1120 Via Callejon, San Clemente, CA 92673 (http://www.sothbaytech.com).
14. IMAGE J REFERENCE: Free software available from NIH at (http://rsb.info.nih.gov/ij/).
15. Edmund Industrial Optics, 101 East Gloucester Pile, Barrington, NJ 08007 (http://www.edmundoptics.com).
16. M. Schumacher, CAMECA Instruments, computer program.
17. SRIM, J. Ziegler, IBM Research (http://www.srim.org).
18. KLA-Tencor, Inc., 160 Rio Robles, San Jose, CA 95134 (http://www.tencor.com/).
19. J. M. McKinley, F. A. Stevie, C. N. Granger, and D. Renard, J. Vac. Sci. Technol. A 18, 273 (2000).