Trends in combining techniques for the deposition of new application-tailored thin films

Plasma Processes and Polymers

Volumn 4, Issue 3, 2007, Pages 282-292

  Dinescu, Gheorghe ^a   Ruset, Cristian ^a   Dinescu, Maria ^a  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Combined deposition techniques; Ion implantation; Magnetron sputtering; Plasma techniques; Pulsed laser depostion; Radiofrequency plasma beam; Thin films

Indexed keywords

BEAM PLASMA INTERACTIONS; CHEMICAL VAPOR DEPOSITION; ION IMPLANTATION; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; PLASMA SOURCES; PULSED LASER DEPOSITION;

COMBINED DEPOSITION TECHNIQUES; PLASMA TECHNIQUES; RADIOFREQUENCY PLASMA BEAM; TAILORED THIN FILMS;

THIN FILMS;

EID: 34248381289     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200600178     Document Type: Article

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