SCOPUS 정보 검색 플랫폼

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 1132-1136

Nanostructured carbon growth by expanding RF plasma assisted CVD on Ni-coated silicon substrate

(3) Vizireanu, S I a Mitu, B a Dinescu, G a

a NATIONAL INSTITUTE FOR LASER (Romania)

Author keywords

Expanding radiofrequency plasma; Magnetron sputtering; Nanostructured carbon; Nickel catalyst; Plasma enhanced vapor deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; CATALYSTS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NICKEL; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

EXPANDING RADIOFREQUENCY PLASMA; NANOSTRUCTURED CARBON FILMS; NICKEL CATALYST;

THIN FILMS;

NANOSTRUCTURE;

EID: 24644474056 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.02.101 Document Type: Article

Times cited : (19)

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