X-ray diffraction study of stress relaxation in cubic boron nitride films grown with simultaneous medium-energy ion bombardment

Applied Physics Letters

Volumn 85, Issue 24, 2004, Pages 5905-5907

  Abendroth, B ^a   Gago, R ^a   Eichhorn, F ^a   Moller W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; ION BOMBARDMENT; ION IMPLANTATION; MAGNETRON SPUTTERING; STRESS RELAXATION; THIN FILMS; X RAY DIFFRACTION;

CHARGE PARTICLES; DEPOSIT ENERGY; MEDIUM-ENERGY ION BOMBARDMENT; NUCLEAR INTERACTION;

CUBIC BORON NITRIDE;

EID: 20444493984     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1836868     Document Type: Article

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