Composition and formation mechanism of zirconium oxynitride films produced by reactive direct current magnetron sputtering

Physica Status Solidi (A) Applied Research

Volumn 201, Issue 5, 2004, Pages 967-976

  Ngaruiya, J M ^a,b   Kappertz, O ^a   Liesch, C ^a   Muller P ^a   Dronskowski, R ^a   Wuttig, M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b KENYATTA UNIVERSITY   (Kenya)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DEPOSITION; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THERMODYNAMICS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DIRECT CURRENT; FORMATION MECHANISM; MASS DEPOSITION RATE; THERMOCHEMISTRY;

ZIRCONIUM COMPOUNDS;

EID: 2442497400     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200306774     Document Type: Conference Paper

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