Properties of ZrNx films with x > 1 deposited by reactive radiofrequency magnetron sputtering

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1307-1313

  Rizzo, A ^a   Signore, M A ^a   Mirenghi, L ^a   Serra, E ^a  

^a ENEA   (Italy)

Author keywords

Optical properties; Sputtering; X ray photoelectron spectroscopy; Zirconium nitride

Indexed keywords

DEPOSITION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SURFACE PHENOMENA; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

NITROGEN PARTIAL PRESSURE; OPTICAL ANALYSIS; REACTIVE RADIOFREQUENCY MAGNETRON SPUTTERING; ZIRCONIUM NITRIDE;

OPTICAL FILMS;

EID: 33751211870     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.03.020     Document Type: Article

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