Dry etching characteristics of (Ba0.6,Sr0.4)TiO 3 thin films in high density CF4/Ar plasma

Surface and Coatings Technology

Volumn 171, Issue 1-3, 2003, Pages 273-279

  Kang, Pil Seung ^a   Kim, Kyoung Tae ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a   Efremov, Alexander M ^a,b  

^a Chung Ang University   (South Korea)

^b IVANOVO STATE UNIVERSITY   (Russian Federation)

Author keywords

BST; Etching; Inductively coupled plasma; Secondary ion mass spectrometer; X ray photoelectron spectroscopy

Indexed keywords

ARGON; DRY ETCHING; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; PLASMA DENSITY; REACTIVE ION ETCHING; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH DENSITY PLASMAS;

THIN FILMS;

ETCHING; FILM; PLASMA;

EID: 0038044542     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00285-8     Document Type: Article

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