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Volumn 28, Issue 5, 2007, Pages 452-454

A dynamical power-management demonstration using four-terminal separated-ate FinFETs

Author keywords

CMOS inverter; Etch back; FinFET; Four terminal (4T); Power management; Vth

Indexed keywords

BIAS VOLTAGE; CMOS INTEGRATED CIRCUITS; ELECTRIC INVERTERS; GATE DIELECTRICS; POWER CONTROL; THRESHOLD VOLTAGE; VOLTAGE CONTROL;

EID: 34247620865     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2007.895451     Document Type: Article
Times cited : (8)

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    • Endo, K.1    Masahara, M.2    Liu, Y.X.3    Matsukawa, T.4    Ishii, K.5    Sugimata, E.6    Takashima, H.7    Yamauchi, H.8    Suzuki, E.9
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    • Dopant profiling in vertical ultrathin channels of double-gate metal-oxide-senticonductor field-effect transistors by using scanning nonlinear dielectric microscopy
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    • M. Masahara, S. Hosokawa, T. Matsukawa, K. Endo, Y. Naitou, H. Tanoue, and E. Suzuki, "Dopant profiling in vertical ultrathin channels of double-gate metal-oxide-senticonductor field-effect transistors by using scanning nonlinear dielectric microscopy," Appl. Phys. Lett., vol. 85, no. 18, pp. 4139-4141, Nov. 2004.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.