Quantitative analysis of sputter processes in a small magnetron system

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 6, 2005, Pages 1714-1720

  Knittel, Ivo ^a   Gothe, Marc ^a   Hartmann, Uwe ^a  

^a SAARLAND UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BALLISTICS; CHEMICAL ANALYSIS; SPUTTER DEPOSITION; TITANIUM;

DEPOSITION RATES; SPUTTER PROCESSES;

MAGNETRONS;

EID: 31044448036     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2091197     Document Type: Article

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