Modeling phase separation in nonstoichiometric silica

Physical Review Letters

Volumn 93, Issue 13, 2004, Pages

  Burlakov, V M ^a,d   Briggs, G A D ^a   Sutton, A P ^a,e   Bongiorno, Angelo ^b,c   Pasquarello, Alfredo ^b,c  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b EPFL   (Switzerland)

^c Ecl Polytech Fed de Lausanne   (Switzerland)

^d INSTITUTE OF SPECTROSCOPY   (Russian Federation)

^e AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CONCENTRATION (PROCESS); DIFFUSION; HIGH TEMPERATURE EFFECTS; MATHEMATICAL MODELS; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; OXIDATION; PROBABILITY; SEMICONDUCTOR QUANTUM DOTS; SILICA;

NONSTOICHIOMETRIC SILICA; SILICA MATRICES; SILICON ATOMS; SILICON QUANTUM DOTS;

PHASE SEPARATION;

EID: 19644377837     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.93.135501     Document Type: Article

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