Low-stress silicon carbonitride for the machining of high-frequency nanomechanical resonators

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 1, 2007, Pages 33-37

  Fischer, L M ^a   Wilding, N ^a   Gel, M ^a   Evoy, S ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

FLOW OF GASES; MACHINING; NANOMECHANICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RESONATORS; X RAY PHOTOELECTRON SPECTROSCOPY;

BEAM RESONATORS; GAS FLOW RATIOS; NANOMECHANICAL RESONATORS; SILICON CARBONITRIDE;

SILICON COMPOUNDS;

EID: 34047142290     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2402153     Document Type: Article

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