Polycrystalline silicon-carbide surface-micromachined vertical resonators - Part I: Growth study and device fabrication

Journal of Microelectromechanical Systems

Volumn 14, Issue 3, 2005, Pages 567-578

  Wiser, Robert F ^a   Chung, Juyong ^a,b   Mehregany, Mehran ^a   Zorman, Christian A ^a  

^a Case Western Reserve University   (United States)

^b Sunel Technologies   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRODES; EPITAXIAL GROWTH; FILMS; MICROMACHINING; NATURAL FREQUENCIES; POLYCRYSTALLINE MATERIALS; POLYSILICON; RESONATORS; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; X RAY DIFFRACTION ANALYSIS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; MICROMECHANICAL RESONATORS;

MICROELECTROMECHANICAL DEVICES;

EID: 22444446335     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2005.844747     Document Type: Article

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