Measurement of residual stress by slot milling with focused ion-beam equipment

Journal of Micromechanics and Microengineering

Volumn 16, Issue 2, 2006, Pages 254-259

  Sabate N ^a,b   Vogel, D ^a   Gollhardt, A ^a   Keller, J ^a   Cane C ^c   Gracia I ^c   Morante, J R ^b   Michel, B ^a  

^a Fraunhofer Institute Reliability and Microintegration   (Germany)

^b UNIVERSITY OF BARCELONA   (Spain)

^c INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; IMAGING TECHNIQUES; ION BEAMS; MILLING (MACHINING); SILICON NITRIDE;

DISPLACEMENT FIELDS; ION-BEAM EQUIPMENT; SLOT MILLING;

RESIDUAL STRESSES;

EID: 31344472868     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/16/2/009     Document Type: Article

References (17)

1. Schweitz J A 1992 Mechanical characterization of thin films by micromechanical techniques MRS Bull. (July) 34-45
2. Tabata O, Kawahata A, Sugiyama S and Igarashi I 1989 Mechanical property measurement of thin films using load-deflection of composite rectangular membranes Sensors Actuators 20 135-41
3. Edwards R L, Coles G and Sharpe W N 2004 Comparison of tensile and bulge tests for thin-film silicon nitride Exp. Mech. 49 49-54
4. Guckel H, Randazzo T and Burns D W 1985 A simple technique for the determination of mechanical strain in thin films with applications to polysilicon J. Appl. Phys. 57 1671-4
5. Lepienski C M, Pharr G M, Park Y J, Watkins T R, Misra A and Zhang X 2004 Factors limiting the measurement of residual stresses in thin films by nanoindentation Thin Solid Films 251 447-52
6. Senez V, Armigliato A, Wolf I, Carnevale G, Balboni R, Frabboni S and Benedetti A 2003 Strain determination in silicon microstructures by combined convergent beam electron diffraction, process simulation, and micro-Raman spectroscopy J. Appl. Phys. 94 5574
7. Li B, Tang X, Xie H and Zhang X 2004 Strain analysis in MEMS/NEMS structures and devices by using focused ion beam system Sensors Actuators A 111 57-62
8. Kang K J, Yao N, He M Y and Evans A G 2003 A method for in situ measurement of the residual stress in thin films by using the focused ion beam Thin Solid Films 443 71-7
9. Sabaté N et al 2005 Local stress measurement in micromachined membrane-based sensors Proc. of Eurosensors XIX Conf. (Barcelona, Sept. 2005) at press
10. Vogel D, Gollhardt A and Michel B 2002 Micro and nanomaterials characterization by image correlation methods Sensors Actuators A 99 165-71
11. Sutton M A, Walters W J, Peters W H, Ranson W F and Neil S R 1983 Determination of displacements using an improved digital image correlation method Image Vis. Comput. 1 133-9
12. Sabaté N et al 2005 Characterization of thermal conductivity in thin film multilayered membranes Thin Solid Films 484 328-34
13. Puigcorbe J, Vogel D, Michel B, Vila A, Gracia I, Cane C and Morante J R 2003 Thermal and mechanical analysis of micromachined gas sensors J. Micromech. Microeng. 13 548-56
14. Sabaté N et al 2005 Mechanical characterization of thermal flow sensor membranes Sensors Actuators A at press
15. Keller J, Vogel D, Schubert A and Michel B 2004 Displacement and strain field measurements from SPM images Applied Scanning Probe Methods ed B Bhushan, H Fuchs and S Hosaka (Berlin: Springer) pp 253-76
16. Tada H, Paris P C and Irwin G R 2000 The Stress Analysis of Cracks Handbook (New York: ASME Press)
17. Gas-el-Hak M 2002 The MEMS Handbook (Boca Raton, FL: CRC Press)