Application of high spatial resolution scanning work function spectroscopy to semiconductor surfaces and interfaces

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 2, 2007, Pages 334-342

  Gao, Min ^a,b   Brillson, L J ^a  

^a The Ohio State University   (United States)

^b PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH SPATIAL RESOLUTION WORK FUNCTION SPECTROSCOPY; SCANNING AUGER MICROSCOPES; SEMICONDUCTOR SURFACES;

BAND STRUCTURE; ELECTRON EMISSION; INTERFACES (MATERIALS); SCANNING; SEMICONDUCTOR JUNCTIONS; SEMICONDUCTOR MATERIALS; SILICON CARBIDE;

AUGER ELECTRON SPECTROSCOPY;

EID: 34047121651     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2464117     Document Type: Article

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