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Volumn 230, Issue 1-4, 2004, Pages 327-333

Effect of backscattered electrons on the analysis area in scanning Auger microscopy

Author keywords

Analysis area; Backscattered electrons; Scanning Auger microscopy

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELEMENTARY PARTICLES; FUNCTIONS; GAUSSIAN NOISE (ELECTRONIC); IONIZATION; MATHEMATICAL MODELS; MONTE CARLO METHODS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 2542497211     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.01.073     Document Type: Article
Times cited : (19)

References (39)
  • 15
    • 0842305326 scopus 로고    scopus 로고
    • Standard E 673-01, vol. 3.06, ASTM International, West Conshohocken, PA
    • Standard E 673-01, Annual Book of ASTM Standards 2002, vol. 3.06, ASTM International, West Conshohocken, PA, 2002, p. 755.
    • (2002) Annual Book of ASTM Standards 2002 , pp. 755
  • 16
    • 0003814221 scopus 로고    scopus 로고
    • ISO 18115: 2001, International Organization for Standardization, Geneva
    • ISO 18115: 2001, Surface Chemical Analysis - Vocabulary, International Organization for Standardization, Geneva, 2001.
    • (2001) Surface Chemical Analysis - Vocabulary
  • 28


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.