Comparative study of the structure of a-CNx and a-CN x:H films using NEXAFS, XPS and FT-IR analysis

Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 156-166

  Bouchet Fabre, B ^a   Zellama, K ^b   Godet, C ^c   Ballutaud, D ^d   Minea T ^e  

^a CEA SACLAY   (France)

^b Universite de Picardie Jules Verne   (France)

^c LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^d Centre National de la Recherche Scientifique   (France)

^e INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

Amorphous carbon; Carbon nitride; FT IR; NEXAFS; Thin films; XPS

Indexed keywords

CARBON NITRIDE; CHEMICAL BONDS; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; MAGNETRON SPUTTERING; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON; AROMATIC RINGS; ENERGY RESOLUTIONS; NEXAFS;

CARBON;

EID: 17744381799     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.134     Document Type: Conference Paper

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