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Volumn 72, Issue 4, 2005, Pages
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Roughness conformity during tungsten film growth: An in situ synchrotron x-ray scattering study
a a b c |
Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 33749233465
PISSN: 10980121
EISSN: 1550235X
Source Type: Journal
DOI: 10.1103/PhysRevB.72.045445 Document Type: Article |
Times cited : (30)
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References (21)
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