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Volumn 72, Issue 4, 2005, Pages

Roughness conformity during tungsten film growth: An in situ synchrotron x-ray scattering study

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EID: 33749233465     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.72.045445     Document Type: Article
Times cited : (30)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.