Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics

Journal of Synchrotron Radiation

Volumn 11, Issue 4, 2004, Pages 343-346

  Mimura, Hidekazu ^a   Yamauchi, Kazuto ^a   Yamamura, Kazuya ^a   Kubota, Akihisa ^a   Matsuyama, Satoshi ^a   Sano, Yasuhisa ^a   Ueno, Kazumasa ^a   Endo, Katsuyoshi ^a   Nishino, Yoshinori ^c   Tamasaku, Kenji ^c   Yabashi, Makina ^b   Ishikawa, Tetsuya ^c   Mori, Yuzo ^a  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c RIKEN ^*  (Japan)

Author keywords

Coherent X rays; EEM; MSI; Wave optical simulation; X ray focusing; X ray projection microscopes

Indexed keywords

COHERENT LIGHT; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE INTERFERENCE; ELECTROMAGNETIC WAVE REFLECTION; FOCUSING; IMAGE QUALITY; INTERFEROMETERS; MIRRORS; X RAY OPTICS;

COHERENT X-RAYS; EEM; ELASTIC EMISSION MACHINING (EEM); MICROSTITCHING INTERFEROMETRY (MSI); MSI; WAVE OPTICAL SIMULATION; X-RAY FOCUSING; X-RAY PROJECTION MICROSCOPES;

X RAY MICROSCOPES;

ARTICLE; EQUIPMENT; EQUIPMENT DESIGN; EVALUATION; INSTRUMENTATION; METHODOLOGY; MICROSCOPY; OPTICS; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; VALIDATION STUDY; X RAY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MICROSCOPY; OPTICS; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; X-RAYS;

EID: 3843134186     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S090904950401283X     Document Type: Article

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