Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm

Review of Scientific Instruments

Volumn 76, Issue 6, 2005, Pages

  Yumoto, Hirokatsu ^a   Mimura, Hidekazu ^a   Matsuyama, Satoshi ^a   Hara, Hideyuki ^a   Yamamura, Kazuya ^a   Sano, Yasuhisa ^a   Ueno, Kazumasa ^a   Endo, Katsuyoshi ^a   Mori, Yuzo ^a   Yabashi, Makina ^b   Nishino, Yoshinori ^c   Tamasaku, Kenji ^c   Ishikawa, Tetsuya ^c   Yamauchi, Kazuto ^a  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c SPring 8/RIKEN ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPTICALLY FIGURED MIRROR; ENERGY TUNABILITY; MICROSTITCHING INTERFEROMETRY; X-RAY FOCUSING MIRROR;

COMPUTER CONTROL; FABRICATION; INTERFEROMETRY; MACHINING; VAPORIZATION; X RAYS;

MIRRORS;

EID: 20644431771     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1922827     Document Type: Article

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