Relative angle determinable stitching interferometry for hard x-ray reflective optics

Review of Scientific Instruments

Volumn 76, Issue 4, 2005, Pages

  Mimura, Hidekazu ^a   Yumoto, Hirokatsu ^a   Matsuyama, Satoshi ^a   Yamamura, Kazuya ^a   Sano, Yasuhisa ^a   Ueno, Kazumasa ^a   Endo, Katsuyoshi ^a   Mori, Yuzo ^a   Yabashi, Makina ^b   Tamasaku, Kenji ^c   Nishino, Yoshinori ^c   Ishikawa, Tetsuya ^c   Yamauchi, Kazuto ^a  

^a OSAKA UNIVERSITY   (Japan)

^b SPring 8/Japan Synchrt Radiat R ^*  (Japan)

^c RIKEN Harima Institute Research   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMATIC ABERRATIONS; ELASTIC EMISSION MACHINING (EEM); MICROSTITCHING INTERFEROMETRY (MSI); PLASMA CHEMICAL VAPORIZATION MACHINING (PCVM);

ABERRATIONS; MIRRORS; PIEZOELECTRIC DEVICES; REFLECTION; SYNCHROTRON RADIATION; VAPORIZATION; X RAY OPTICS;

INTERFEROMETRY;

EID: 20244370340     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1868472     Document Type: Article

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