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Volumn 42, Issue 11, 2003, Pages 7129-7134

Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining

Author keywords

Coherent X ray; Elastic emission machining (EEM); Hard X ray focusing; Kirkpatrick Baez mirror; Plasma CVM (chemical vaporization machining); SPring 8; Ultraprecision machining; X ray mirror

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; FLUORESCENCE; MICROSCOPIC EXAMINATION; MIRRORS; OPTICAL RESOLVING POWER; PHOTONS; VAPORIZATION; X RAYS;

EID: 1642454603     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.7129     Document Type: Article
Times cited : (69)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.