Deposition of hard amorphous hydrogenated carbon films by radiofrequency parallel-plate hollow-cathode plasmas

Diamond and Related Materials

Volumn 16, Issue 3, 2007, Pages 616-622

  Capote, G ^a   Jacobsohn, L G ^b   Michel, M D ^c   Lepienski, C M ^c   Vieira, A L ^d   Franceschini, D F ^d  

^a INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

^d FLUMINENSE FEDERAL UNIVERSITY   (Brazil)

Author keywords

Amorphous hydrogenated carbon; Hollow cathode; Mechanical properties; Plasma deposition

Indexed keywords

AMORPHOUS FILMS; CATHODES; DEPOSITION; HYDROGENATION; PLASMA ACCELERATORS; STRESSES;

AMORPHOUS HYDROGENATED CARBON; HOLLOW CATHODE; NANOHARDNESS MEASUREMENTS; PLASMA DEPOSITION;

CARBON;

EID: 33846781650     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.11.052     Document Type: Article

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