Thin film processing by radio frequency hollow cathodes

Surface and Coatings Technology

Volumn 97, Issue 1-3, 1997, Pages 723-728

  Bardos L ^a   Barankova H ^a   Berg, S ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

Hollow Cathode; Radio Frequency; Thin Film Processing

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON EMISSION; FILM PREPARATION; IONIZATION OF GASES; PLASMA SOURCES; SILICON NITRIDE; THERMIONIC CATHODES; THIN FILMS; TITANIUM NITRIDE;

PHYSICAL VAPOR DEPOSITION (PVD); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); RADIO FREQUENCY HOLLOW CATHODES;

PROTECTIVE COATINGS;

EID: 0031364827     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00291-0     Document Type: Article

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