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Diamond and Related Materials

Volumn 10, Issue 2, 2001, Pages 125-131

Film growth and relationship between microstructure and mechanical properties of a-C:H:F films deposited by PECVD

(4) Freire Jr , F L a Maia da Costa, M E H a Jacobsohn, L G b Franceschini, D F b

a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO (Brazil)

b FLUMINENSE FEDERAL UNIVERSITY (Brazil)

Author keywords

A C:H films; Flourine; Ion bombarding; PECVD

Indexed keywords

CHEMICAL BONDS; DENSITY (SPECIFIC GRAVITY); FILM GROWTH; FLUOROCARBONS; FRICTION; HARDNESS; INDENTATION; ION BEAMS; ION BOMBARDMENT; METHANE; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; TRIBOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

FRICTION COEFFICIENT; MICROINDENTATION;

AMORPHOUS FILMS;

MECHANICAL PROPERTY;

EID: 0035248133 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(00)00458-1 Document Type: Article

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