Effect of the oxygen deficiency of ceramic TiO2-x targets on the deposition of TiO2 thin films by DC magnetron sputtering

Surface and Interface Analysis

Volumn 36, Issue 8, 2004, Pages 1167-1170

  Poelman, H ^a   Tomaszewski, H ^b   Poelman, D ^a   Depla, D ^a   De Gryse, R ^a  

^a GHENT UNIVERSITY   (Belgium)

^b Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

Author keywords

Ceramic TiO2 targets; DC magnetron sputtering; TiO2 thin films; Visible ultraviolet absorption spectroscopy; XPS

Indexed keywords

CATALYTIC PROCESSES; CERAMIC TIO2-X TARGETS; DC MAGNETRON SPUTTERING; VISIBLE/ULTRAVIOLET ABSORPTION SPECTROSCOPY;

ABSORPTION SPECTROSCOPY; CATALYSIS; CERAMIC MATERIALS; DEPOSITION; OXYGEN; POWDERS; SPUTTERING; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 4444356572     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1867     Document Type: Conference Paper

References (10)

1. Vergöhl M, Malkomes N, Staedler T, Matthée T, Richter U. Thin Solid Films 1999; 351:42.
2. EUROCAT special issue, Catal. Today 1994; 20: complete volume.
3. Graetzel M. Comment. Inorg. Chem. 1991; 12: 93.
4. Ferroni M, Guidi V, Martinelli G, Nelli P, Sberveglieri G. Sensors and Actuators B - Chemical 1997; 44: 499.
5. Kim SB, Hong SC. Appl. Catal. B: Environmental 2002; 35: 305.
6. Poelman H, Poelman D, Depla D, Tomaszewski H, Fiermans L, De Gryse R. Surf. Sci. 2001; 482: 940.
7. Szczyrbowski J, Bräuer G, Ruske M, Teschner G, Zmelty A. J. Non-Cryst. Solids 1997; 218: 262.
8. Berg S, Blom H-O, Larsson T, Nender C. J. Vac. Sci. Technol. 1987; A5: 202.
9. Smy T, Tan L, Winterton SS, Dew SK, Brett MJ. J. Vac. Sci. Technol. 1997; A15: 2847.
10. Westwood WD. AVS Education Committee Book Series vol. 2, Sputter Deposition 2003; AVS: New York, 93.