Methods for analyzing and compensating for systematic mask CD errors

Solid State Technology

Volumn 49, Issue 12, 2006, Pages 35-42

  Buck, Peter ^a   Nakagawa, Kent ^a   Kalk, Franklin ^a  

^a Toppan Photomasks Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED MASK LITHOGRAPHY; CD ERRORS; ERROR SOURCES; SYSTEMATIC MASKS;

ERROR COMPENSATION; ERROR CORRECTION; LITHOGRAPHY; MATHEMATICAL MODELS;

SYSTEMATIC ERRORS;

EID: 33846276493     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (12)

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