PEC-fogging effect analysis using high-performance EB simulator capable of large area mask pattern simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 767-775

  Kuwahara, Naoko ^a   Ohfuji, Takeshi ^b   Hayashi, Naoya ^a   Jackson, Curt ^b   Kitano, Naoki ^b   Hwang, David H ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b INTEL CORPORATION   (United States)

Author keywords

Chemically Amplification Resist; EB; Fogging effect; MonteCalro; Proximity effect; Resist; Simulation

Indexed keywords

COMPUTER SIMULATION; ERROR ANALYSIS; MONTE CARLO METHODS; PATTERN RECOGNITION; PHOTORESISTS;

FOGGING EFFECT;

MASKS;

EID: 0037627657     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468466     Document Type: Conference Paper

References (13)

1. C. A. Mack, "Electron-beam lithography simulation for mask making, Part VI: Comparison of 10 and 50kV GHOST proximity effect correction", Proc. SPIE 3236, pp.194-203, 2001.
2. K. Ohtoshi, H. Sunaoshi, J. Takamatsu, F. Okabe, K. Ishibashi, S. Yoshitake, H. Yamada, S. Tamamushi, H. Anze, T. Kamikubo, and Y. Ogawa, "Writing accuracy of EBM-3500 electron beam mask writing system", Proc. SPIE 4409, pp.238-247, 2001.
3. T. Komagata, Y. Nakagawa, N. Gotoh, and K. Tanaka, "Performance of improved e-beam lithgraphybsystem JBX-9000MVII", Proc. SPIE 4409, pp.248-257, 2001.
4. A. Fujii, K. Mizuno, T. Nakahara, S. Asai, Y. Kadowaki, H. Shimada, H. Touda, K. Iizumi, H. Takahashi, K. Oonuki, T. Kawahara, K. Kawasaki, K. Nagata, and H. Satoh, "Adbanced e-beam reticle writing system for mext generation reticle fabrication", Proc. SPIE 4409, pp.258-269, 2001.
5. M. Sugiyama, S. Kubo, K. Hiruta, T. Iwamatsu, T. Fujisawa, and H. Morimoto, "Proximity effect correction for reticle fabrication", Proc. SPIE 4066, pp.180-187, 2000.
6. Y. Nozaki, T. Tanaka, K. Takushima, S. Suzuki, A. Endo, K. Sogo, and Y. Kimura, "Fogging Effect Compensation Technique for Photomask Making", Proc. SPIE 4066, pp.188-199, 2000.
7. Y. Kuzumin, and C. A. Mack, "Comprehensive simulation of E-beam lithography process using PROLITH/3D and TEMPTATIONS software tools," Proc. SPIE 4186, pp. 503-512, 2000.
8. N. Kuwahara, H. Nakagawa, M. Kurihara, N. Hayashi, H. Sano, E. Maruta, T. Takikawa, and S. Noguchi, "Preliminary evaluation of proximity and resist heating effects observed in high acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication", Proc. SPIE 3748, pp.115-125, 1999.
9. H. Satoh, Y. Someda, N. Saitou, K. Kawasaki, K. Mizuno, Y. Kadowaki, M. Hoga, and T. Soga, "Performance Improvement in e-beam Reticle Writer HL-800M," Proc. SPIE 3096, pp77-83, 1997.
10. T. Kamikubo, T. Abe, S. Oogi, H. Anze, M. Shimizu, M. Itoh, T. Nakasugi, T. Iijima, and Y. Hattori, "Proximity effect correction for reticle fabrication," Proc. SPIE 3096, pp173-177, 1997.
11. C. A. Mack, "Electron-beam lithography simulation for mask making, Part I", Proc. SPIE 3236, pp.216-227, 1997.
12. C. A. Mack, C. A. Sauer, and D. Alexander, "Electron-beam lithography simulation for mask making, Part II: Comparison of the lithographic performance of PBS and EBR900-M1", Proc. SPIE 3236, pp.413-423, 1997.
13. T. Ohfuji, A. G. Timco, O. Nalamasu, and D. R. Stone, "Dissolution rate and modeling of a chemically amplified positive resist," Proc. SPIE 1925, pp262-273, 1993.