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Volumn 4186, Issue , 2001, Pages 22-33
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Performance of JBX-9000MV with negative tone resist for 130nm reticle
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Author keywords
CD accuracy; Chemically amplified negative tone resist; Foggy effect; High accelerating voltage EB; Loading effect
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Indexed keywords
BACKSCATTERING;
DRY ETCHING;
ERROR CORRECTION;
CRITICAL DIMENSION (CD) ERRORS;
PROXIMITY EFFECT CORRECTION (PEC);
PHOTORESISTS;
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EID: 0035046909
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.410702 Document Type: Conference Paper |
Times cited : (8)
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References (0)
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