Experimental characterization of constituent errors in electron-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Cinque, Russell ^a   Buck, Peter ^a   Yeo, KyungsooS ^a   Komagata, Tadashi ^b   Nakagawa, Yasutoshi ^c  

^a Toppan Photomasks Inc   (United States)

^b JEOL USA INC   (United States)

^c JEOL LTD   (Japan)

Author keywords

Critical dimension; Electron beam lithography; JEOL JBX 9000MV; Photomask

Indexed keywords

CRITICAL DIMENSION; JEOL JBX-9000MV; PHOTOMASKS;

CALIBRATION; DEFLECTION (STRUCTURES); ELECTRIC FIELDS; ERROR ANALYSIS;

ELECTRON BEAM LITHOGRAPHY;

EID: 33748061662     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681748     Document Type: Conference Paper

References (0)