Advanced write tool effects on 100 nm node OPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 147-156

  Buck, Peter ^a   Green, Kent ^a   Ibsen, Kent ^a   Nakagawa, Kent ^a   Hong, Dongsung ^a   Krishnan, Prakash ^a   Coburn, Dianna ^a  

^a NONE

Author keywords

ALTA 4000; E beam lithography; JBX 9000; Mask; Modeling; OPC; Optical mask lithography; Photomask; Simulation

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; ELECTRON BEAM LITHOGRAPHY; MASKS;

PATTERN GENERATORS (PG);

INTEGRATED CIRCUITS;

EID: 0037627760     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467761     Document Type: Conference Paper

References (7)

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2. K. Ibsen, et al., "Photomask pattern generation strategies", Microlithography World, Vol. 11 No. 2, pp. 10-14, May 2002.
3. P. Buck, "Optical lithography: The future of mask manufacturing", Microlithography World Vol. 11 No. 3, pp. 22-28, August 2002.
4. T. Komagata, et al., "Performance of the improved JBX-9000MV e-beam lithography system", Proc. SPIE Vol. 4343, pp. 736-745, 2001.
5. M. Bohan, et. al., "Implementation and characterization of a DUV raster-scanned mask pattern generation system", Proc. SPIE Vol.4562, pp. 16-37, 2002.
6. T. Sandström et. al., "Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond", Proc. SPIE Vol. 4409, pp. 270-276, 2001.
7. P. Buck, "Role of mask acuity in advanced lithographic process design", Proc. SPIE Vol. 4692, pp. 471-477, 2002.