Development of a next generation e-beam lithography system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 45-54

  Nakagawa, Y ^a   Komagata, T ^a   Takemura, H ^a   Gotoh, N ^a   Tanaka, K ^a  

^a JEOL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; CURVE FITTING; ELECTRIC POTENTIAL; ELECTRIC SPACE CHARGE; ELECTRON OPTICS; ELECTROSTATICS; MASKS; ULSI CIRCUITS;

ELECTRON OPTICAL SYSTEMS; RETICLE MASKS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032300314     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332823     Document Type: Conference Paper

References (2)