Reduction of fogging effect caused by scattered electrons in an electron beam system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 408-415

  Shimomura, Naoharu ^a   Ogasawara, Munehiro ^a   Takamatsu, Jun ^a   Yoshitake, Shusuke ^a   Ooki, Kenji ^a   Nakayamada, Noriaki ^a   Okabe, Fumiyuki ^a   Tojo, Toru ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ABSORPTION; ELECTRON SCATTERING; OPTICAL INSTRUMENT LENSES;

CRITICAL DIMENSION (CD); FOGGING EFFECTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032678932     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360242     Document Type: Conference Paper

References (2)