Electron beam lithography simulation for mask making, part i

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3236, Issue , 1997, Pages 216-227

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM SHAPES; ENERGY DISTRIBUTIONS; MASK MAKINGS; MONTE CARLO SIMULATIONS; NEW MODELS; RESIST PATTERNS;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON GUNS; MASKS; MONTE CARLO METHODS; PARTICLE BEAMS; PHOTORESISTS; THREE DIMENSIONAL;

PIXELS;

EID: 0010896594     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.301194     Document Type: Conference Paper

References (18)

1. C. A. Mack, "Three-Dimensional Electron Beam Lithography Simulation," Emerging Lithographic Technologies, Proc., SPIE Vol. 3048 (1997) pp. 76-88.
2. N. Eib, D. Kyser, and R. Pyle, "Electron Resist Process Modeling," Chapter 4, Lithography for VLSI, VLSI Electronics - Microstructure Science Volume 16, R. K. Watts and N. G. Einspruch, eds., Academic Press (New York:1987) pp. 103-145.
3. Electron-Beam Technology in Microelectronic Fabrication, George R. Brewer, ed., Academic Press (New York: 1980).
4. Kamil A. Valiev, The Physics of Submicron Lithography, Plenum Press (New York: 1992).
5. K. Murata, T. Matsukawa, and R. Shimizu, "Monte Carlo Calculations on Electron Scattering in a Solid Target," Japanese Journal of Applied Physics, Vol. 10, No. 6 (June, 1971) pp. 678-686.
6. R. Shimizu and T. E. Everhart, "Monte Carlo Simulation of the Energy Dissipation of an Electron Beam in an Organic Specimen," Optik, Vol. 36, No. 1 (1972) pp. 59-65.
7. R. J. Hawryluk, A. M. Hawryluk, and H. Smith, "Energy Dissipation in a Thin Polymer Film by Electron Beam Scattering," Journal of Applied Physics, Vol. 45, No. 6 (June, 1974) pp. 2551-2566.
8. D. F. Kyser and N. S. Viswanathan, "Monte Carlo Simulation of Spatially Distributed Beams in Electron-Beam Lithography," Journal of Vacuum Science and Technology, Vol. 12, No. 6 (Nov/Dec, 1975) pp. 1305-1308.
9. M. G. Rosenfield, A. R. Neureuther, and C. H. Ting, Journal of Vacuum Science and Technology, Vol. 19, No. 4 (Nov/Dec, 1981) pp. 1242-.
10. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of Positive Photoresist," IEEE Trans. Electron Dev., ED-22, No. 7, (1975) pp. 445-452, and Kodak Microelectronics Seminar Interface 74(1974) pp. 44-54.
11. C. A. Mack, "Absorption and Exposure in Positive Photoresist," Applied Optics, Vol. 27, No. 23 (1 Dec. 1988) pp. 4913-4919.
12. A. R. Neureuther, M. Zuniga, and N. Rau, "Modeling of the Patterning Process with Chemically-Amplified Resists," Microprocess and Nanotechnology '97, Proc. (1997).
13. C. A. Mack, "Development of Positive Photoresist," Jour. Electrochemical Society, Vol. 134, No. 1 (Jan. 1987) pp. 148-152.
14. C. A. Mack, "New Kinetic Model for Resist Dissolution," Jour. Electrochemical Society, Vol. 139, No. 4 (Apr. 1992) pp. L35-L37.
15. A. R. Neureuther, D. F. Kyser, and C. H. Ting, "Electron-Beam Resist Edge Profile Simulation," IEEE Trans. Electron Dev., ED-26, No. 4, (1979) pp. 686-693.
16. C. A. Mack, "Lithographic Effects of Acid Diffusion in Chemically Amplified Resists," OCG Microlithography Seminar Interface '95, Proc, (1995) pp. 217-228, and Microelectronics Technology: Polymers for Advanced Imaging and Packaging, ACS Symposium Series 614, E. Reichmanis, C. Ober, S. MacDonald, T. Iwayanagi, and T. Nishikubo, eds., ACS Press (Washington: 1995) pp. 56-68.
17. J. S. Petersen, C. A. Mack, J. Sturtevant, J. D. Myers and D. A. Miller, "Non-constant Diffusion Coefficients: Short Description of Modeling and Comparison to Experimental Results," Advances in Resist Technology and Processing XII, Proc., SPIE Vol. 2438 (1995) pp. 167-180.
18. th Annual BACUS Symposium on Photomask Technology and Management, SPIE Vol. 3236 (1997).