-
2
-
-
0030379795
-
An industrial perspective of technology CAD for advanced CMOS technologies
-
Bold B S 1996 An industrial perspective of technology CAD for advanced CMOS technologies Microelectron. Eng. 34 65-9
-
(1996)
Microelectron. Eng.
, vol.34
, pp. 65-69
-
-
Bold, B.S.1
-
9
-
-
0031655217
-
The future of lithography after 193 nm optics
-
Mackay R S 1998 The future of lithography after 193 nm optics Microelectron. Eng. 41/42 71-4
-
(1998)
Microelectron. Eng.
, vol.41-42
, pp. 71-74
-
-
Mackay, R.S.1
-
10
-
-
0029378440
-
Simulation of the two-dimensional photoresist etching process in integrated circuit fabrication using cellular automata
-
Karafyllidis I and Thanailakis A 1995 Simulation of the two-dimensional photoresist etching process in integrated circuit fabrication using cellular automata Modelling Simul. Mater. Sci. Eng. 3 629-42
-
(1995)
Modelling Simul. Mater. Sci. Eng.
, vol.3
, pp. 629-642
-
-
Karafyllidis, I.1
Thanailakis, A.2
-
11
-
-
0030086631
-
Simulation of the image reversal submicron process in integrated circuit fabrication
-
Karafyllidis I and Thanailakis A 1996 Simulation of the image reversal submicron process in integrated circuit fabrication Semicond. Sci. Technol. 11 214-20
-
(1996)
Semicond. Sci. Technol.
, vol.11
, pp. 214-220
-
-
Karafyllidis, I.1
Thanailakis, A.2
-
12
-
-
0031235775
-
Simulation of the negative chemical amplification deep-ultraviolet process in integrated circuit fabrication
-
Karafyllidis I 1997 Simulation of the negative chemical amplification deep-ultraviolet process in integrated circuit fabrication Microelectron. Eng. 34 155-70
-
(1997)
Microelectron. Eng.
, vol.34
, pp. 155-170
-
-
Karafyllidis, I.1
-
14
-
-
0001368709
-
Developer temperature effect on negative deep ultraviolet resists: Characterization modeling and simulation
-
Hagouel P I, Karafyllidis I and Neureuther A R 1997 Developer temperature effect on negative deep ultraviolet resists: characterization modeling and simulation J. Vacuum Sci. Technol. B 15 2616-20
-
(1997)
J. Vacuum Sci. Technol. B
, vol.15
, pp. 2616-2620
-
-
Hagouel, P.I.1
Karafyllidis, I.2
Neureuther, A.R.3
-
15
-
-
0031655497
-
Dependence of developed negative resist profiles on exposure energy dose: Experiment modeling and simulation
-
Hagouel P I, Karafyllidis I and Neureuther A R 1998 Dependence of developed negative resist profiles on exposure energy dose: experiment modeling and simulation Microelectron. Eng. 41/42 351-4
-
(1998)
Microelectron. Eng.
, vol.41-42
, pp. 351-354
-
-
Hagouel, P.I.1
Karafyllidis, I.2
Neureuther, A.R.3
-
16
-
-
0000205870
-
Negative resist profiles in 248 nm photolithography: Experiment, modelling and simulation
-
Karafyllidis I, Hagouel P I and Neureuther A R 1998 Negative resist profiles in 248 nm photolithography: experiment, modelling and simulation Semicond. Sci. Technol. 13 603-10
-
(1998)
Semicond. Sci. Technol.
, vol.13
, pp. 603-610
-
-
Karafyllidis, I.1
Hagouel, P.I.2
Neureuther, A.R.3
|