Practical resist model calibration

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1556-1569

  Baluswamy, Pary ^a   Weatherly, Amy ^a   Kewley, Dave ^a   Brooker, Peter ^b   Pauzer, Mike ^b  

^a MICRON TECHNOLOGY INC   (United States)

^b Sigma C   (United States)

Author keywords

Calibration; FIRM; Positive chemically amplified resist; Resist model; SOLID C

Indexed keywords

CALIBRATION; COMPUTER SIMULATION; MATHEMATICAL MODELS; OPTIMIZATION; REFRACTIVE INDEX; SILICON WAFERS; THICKNESS MEASUREMENT;

AERIAL IMAGE MODELING; EMPIRICAL MODEL; POSITIVE CHEMICALLY AMPLIFIED RESIST;

PHOTORESISTS;

EID: 0141498229     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485339     Document Type: Conference Paper

References (13)

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