Investigation of carbon contaminations in SiO2 films on 4H-SiC (0001)

Journal of Applied Physics

Volumn 100, Issue 11, 2006, Pages

  Schürmann, Mark ^a   Dreiner, Stefan ^a   Berges, Ulf ^a   Westphal, Carsten ^a  

^a TU DORTMUND UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CONTAMINATION; FILM GROWTH; OXIDATION; PHOTOEMISSION; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CLUSTERS; CARBON CONTAMINATIONS; PHOTOEMISSION SPECTRUM;

DIELECTRIC FILMS;

EID: 33845805785     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2399307     Document Type: Article

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