Characterization of collector optic material samples before and after exposure in laser produced plasma and discharge produced plasma extreme ultraviolet sources

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 3, 2006, Pages

  Qiu, Huatan ^a   Alman, Darren A ^a   Thompson, Keith C ^a   Spencer, Joshua B ^a   Antonsen, Erik L ^a   Jurczyk, Brian E ^a   Ruzic, D N ^a   Spila, Tim P ^b  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Collector optics; Debris mitigation; Discharge produced plasma; Erosion; EUV; Laser produced plasma

Indexed keywords

COLLECTOR OPTICS; ENERGY SECTOR ANALYZER (ESA); ENERGY SPECTRA; LASER PRODUCED PLASMA (LPP);

DIFFUSION; LASER OPTICS; LASER PRODUCED PLASMAS; MIRRORS; MULTILAYERS; SCANNING ELECTRON MICROSCOPY; XENON;

OPTICAL DEVICES;

EID: 33845391793     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2243082     Document Type: Article

References (18)

1. Huatan Qiu et al., "Characterization of collector optic material samples before and after exposure in LPP and DPP EUV sources," Proc. SPIE 5751, 1211-1222 (2005).
2. D. A. Alman et al., "UIUC collector erosion and optical lifetime project results: Time dependent exposures," Proc. SPIE 5751, 1118-1124 (2005).
3. D. A. Alman, H. Qiu, T. Spila, K. C. Thompson, E. L. Antonsen, B. E. Jurczyk, and D. N. Ruzic, "Characterization of collector optic material samples exposed to a DPP EUV light source," (unpublished).
4. Xtreme Technologies GmbH, www.xtremetec.de, Gottingen, Germany.
5. U. Stamm, "Extreme ultraviolet light sources for use in semiconductor lithography-state of the art and future development," J. Phys. D 37, 3244-3253 (2004).
6. R. J. Anderson, D. A. Buchenauer, L. Klebanoff, O. R. Wood II, and N. V. Edwards, "The erosion of materials exposed to a laser-pulsed-plasma (LPP) extreme ultraviolet (EUV) illumination source," Proc. SPIE 5374, 710-719 (2004).
7. R. J. Anderson, D. A. Buchenauer, K. A. Williams, W. M. Clift, L. E. Klebanoff, N. V. Edwards, O. R. Wood II, and S. Wurm, "Investigation of plasma-induced erosion of multilayer condenser optics," Proc. SPIE 5751, 128-139 (2005).
8. U. Stamm et al., "EUV source power and lifetime: The most critical issues for EUV lithography," Proc. SPIE 5374, 133-144 (2004).
9. E. L. Antonson et al., "XCEED: XTREME commercial EUV exposure diagnostic experiment," Proc. SPIE 5751, 1192-1202 (2005).
10. E. L. Antonson, K. C. Thompson, M. R. Hendricks, D. A. Alamn, B. E. Jurczyk, and D. N. Ruzic, "Ion debris characterization from z-pinch extreme ultraviolet light source," J. Appl. Phys. 99, 063301 (2006).
11. K. C. Thompson, E. L. Antonson, M. R. Hendricks, B. E. Jurczyk, M. Williams, and D. N. Ruzic, "Experimental test chamber design for optics exposure testing and debris characterization of a Xenon discharge produced plasma source for extreme ultraviolet lithography," Microelectron. Eng. 83, 476-484 (2006).
12. S. Bajt et al., "Design and performance of capping layers for extreme-ultraviolet multilayer mirrors," Appl. Opt. 42, 5750-5758 (2003).
13. S. Bajt, J. B. Alameda, T. W. Barbee, Jr., W. M. Clift, J. A. Folta, B. Kaufman, and E. A. Spiller, "Improved reflectance and stability of Mo-Si multilayers," Opt. Eng. 41, 1797-1804 (2002).
14. L. A. Shmaenok et al., "Demonstration of a foil trap technique to eliminate laser plasma atomic debris and small particulates," Proc. SPIE 3331, 90-94 (1998).
15. N. Kandaka, T. Kobayashi, T. Komiya, M. Shiraishi, T. Oshino, and K. Murakami, "Measurement of EUV scattering from Mo-Si multilayer mirrors," 3rd EUVL Symposium, Miyazaki, Japan (2003).
16. J. J. MacFarlane, C. L. Rettig, P. Wang, I. E. Golovkin, and P. R. Woodruff, "Radiation-hydrodynamics, spectral, and atomic physics modeling of laser-produced plasma EUVL light sources," Proc. SPIE 5751, 588-600 (2005).
17. B. E. Jurczyk et al., "The effect of debris on collector optics, its mitigation and repair: Next-step a gaseous Sn EUV DPP source," Proc. SPIE 5751, 572-577 (2005).
18. M. Putero-Vuaroqueaux, H. Faik, and B. Vidai, "A comparative study of the interfacial roughness," J. Phys. Condens. Matter 14, 8955-8968 (2002).