The effect of debris on collector optics, its mitigation and repair: Next-step a gaseous Sn EUV DPP source

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 572-577

  Jurczyk, Brian E ^a   Alman, Darren A ^a   Antonsen, Erik L ^a   Jaworski, Michael A ^a   Williams, Michael J ^a   Ruzic, David N ^a   Spila, Timothy ^a   Edwards, Ginger ^b   Wurm, Stefan ^b   Wood, Obert ^b   Bristol, Robert L ^c  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b SEMATECH   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Collector lifetime; Debris; Debris spectra; Etching; EUV source; Mitigation; Optics; Plasma cleaning

Indexed keywords

COLLECTOR LIFETIME; DEBRIS SPECTRA; EUV SOURCES; MITIGATION; PLASMA CLEANING;

ANTENNA ARRAYS; CHLORIDE MINERALS; DEBRIS; ION BEAMS; LASER PRODUCED PLASMAS; LIGHT SOURCES; MICROANALYSIS; MIRRORS; REACTIVE ION ETCHING; TIN; ULTRAVIOLET RADIATION; VELOCITY MEASUREMENT;

PHOTOLITHOGRAPHY;

EID: 24644449111     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600048     Document Type: Conference Paper

References (3)

1. H. Qiu, D. A. Alman, K. C. Thompson, et al., "Characterization of Collector Optic Material Samples Before and After Exposure in LPP and DPP EUV Sources", SPIE Microlithography 2005. San Jose, CA, 2005.
2. E. L. Antonsen, K. C. Thompson, M. R. Hendricks, et al., "XCEED: XTREME Commercial EUV Exposure Diagnostic Experiment", SPIE Microlithography 2005, San Jose, CA, 2005.
3. M. A. Jaworski, M. J. Williams, E. L. Antonsen, et al., "Secondary RF plasma system for mitigation of EUV source debris and advanced fuels", SPIE Microlithography 2005, San Jose, CA, 2005.