UIUC collector erosion and optical lifetime project results: Time dependent exposures

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 1118-1124

  Alman, Darren A ^a   Qiu, Huatan ^a   Thompson, Keith C ^a   Antonsen, Erik L ^a   Spencer, Joshua B ^a   Hendricks, Matthew R ^a   Jurczyk, Brian E ^a   Ruzic, David N ^a   Spila, Timothy ^a   Edwards, Ginger ^b   Wurm, Stefan ^b   Wood, Obert ^b   Bristol, Robert ^c  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b SEMATECH   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Condenser Optics Lifetime; Damage Characterization; EUV Time Exposure

Indexed keywords

LIGHT SOURCES; LITHOGRAPHY; MIRRORS; PHOTODIODES; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

COLLECTOR OPTICS; CONDENSER OPTIC LIFETIME; DAMAGE CHARACTERIZATION; EUV TIME EXPOSURE;

OPTICAL PROPERTIES;

EID: 24644480108     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599978     Document Type: Conference Paper

References (1)

1. E. L. Antonsen, K. C. Thompson, M. R. Hendricks, et al., "XCEED: XTREME Commercial EUV Exposure Diagnostic Experiment", SPIE Microlithography 2005, San Jose, CA, 2005.