Characterization of collector optic material samples before and after exposure in LPP and DPP EUV sources

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 1211-1222

  Qiu, Huatan ^a   Alman, Darren A ^a   Thompson, Keith C ^a   Coventry, Matthew D ^a   Spencer, Joshua B ^a   Hendricks, Matthew R ^a   Antonsen, Erik L ^a   Jurczyk, Brian E ^a   Ruzic, David N ^a   Spila, Tim P ^a   Edwards, Ginger ^b   Wurm, Stefan ^b   Wood, Obert ^b   Bristol, Robert ^c  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b SEMATECH   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEBRIS; MULTILAYERS; PLASMAS; SCANNING ELECTRON MICROSCOPY; SOCIETIES AND INSTITUTIONS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; XENON;

ENERGY IONS; EUV REFLECTIVITY; LPP SOURCES; X-RAY REFLECTIVITY (XRR);

OPTICAL MATERIALS;

EID: 24644504739     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600093     Document Type: Conference Paper

References (0)