Characteristics of Ru barrier layer in Mo/Ru/Si multilayer for EUV reflector applications

Journal of the Korean Physical Society

Volumn 45, Issue 5 II, 2004, Pages 1229-1232

  Kim, Tae Geun ^a   Ahn, Jinho ^a   Lee, Seung Yoon ^b   Park, Jea Gun ^a  

^a Hanyang University   (South Korea)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

Barrier layer; EUVL; Multilayer; Phase defect correction; Ru

Indexed keywords

EID: 10444248088     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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