Oxidation resistance of Ru-capped EUV multilayers

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 118-127

  Bajt, Saša ^a   Dai, Zu Rong ^a   Nelson, Erik J ^a   Wall, Mark A ^a   Alameda, Jennifer ^a   Nguyen, Nhan ^a   Baker, Sherry ^a   Robinson, Jeffrey C ^a   Taylor, John S ^a   Clift, Miles ^b   Aquila, Andy ^c   Gullikson, Eric M ^c   Edwards, N V Ginger ^d  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d SEMATECH   (United States)

Author keywords

Capping layer; EUVL; Microstructure; Mo Si; Multilayer; Oxidation; Ru; Thermal stability

Indexed keywords

MEASUREMENTS; MICROSTRUCTURE; OPTICAL PROPERTIES; OPTIMIZATION; OXIDATION; RUTHENIUM; SURFACE PROPERTIES; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

CAPPING LAYER; GRAIN MICROSTRUCTURE; MO/SI; STRUCTURAL PROPERTIES;

MULTILAYERS;

EID: 24644474047     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.597443     Document Type: Conference Paper

References (11)

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